Quality:

Isotropic etching - multidirectional etching in semiconductor manufacturing. Article “Isotropic etching” in English Wikipedia has 10 points for quality (as of July 1, 2026).
The article contains 2 references and 1 sections. The article also contains templates indicating quality issues, therefore its score was reduced by 0.53 points.
In June 2026 the article “Isotropic etching” was edited by 1 authors in English Wikipedia and written by 1 authors in all languages.
Since the creation of article “Isotropic etching”, its content was written by 19 registered users of English Wikipedia and edited by 19 registered Wikipedia users in all languages.
The article is cited 3 times in English Wikipedia and cited 3 times in all languages.
The highest Authors Interest rank from 2001:
- Local (English): #19803 in January 2003
- Global: #25078 in January 2003
The highest popularity rank from 2008:
- Local (English): #705213 in October 2008
- Global: #1158268 in October 2008
There is 1 language version for this article in the WikiRank database (of the considered 55 Wikipedia language editions).
The quality and popularity assessment was based on Wikipédia dumps from July 1, 2026 (including revision history and pageviews for previous years).